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XINYI YIMAO ADVANCED MATERIALS CO., LTD.
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Pure tungsten carbide sputtering target, binder free WC target
OverviewQuick DetailsPlace of Origin:China (Mainland)Brand Name:YimaotechModel Number:YMS01Application:IndustryShape:PlateMaterial:TungstenD
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Product Details
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Overview
Quick Details
Place of Origin:
China (Mainland)
Brand Name:
Yimaotech
Model Number:
YMS01
Application:
Industry
Shape:
Plate
Material:
Tungsten
Dimensions:
Customzied
Chemical Composition:
WC
Purity:
99.8%+
SupplyAbility
SupplyAbility:
1000 Piece/Pieces per Month
Packaging & Delivery
Packaging Details
Packing details will be determined by orders
Port
Shanghai or others
Lead Time :
Shipped in 15 working days after payment
Product Introduction

Product:
Pure tungsten carbide sputtering target (binder free WC target).

Application:
Mainly used in parts coating of automotive industry. The film can reduce the friction coefficient and wear rate, so that extend the service life of the components.

Sizes:
170x75x12mm, 125x150x12mm, Dia.100x6mm, or other customized specifications.

Analysis:

Product Packing

We manufacture high quality sputtering targets in pure metals, alloys, and ceramic materials.

We usually adopt Vacuum Melting or Hot Isostatic Pressing (HIP) to produce metal&alloy targets and Hot Pressed Sintering for ceramic targets. We choose the appropriate production process to manufacture the products to meet your specific application requirements.

Our sputtering targets are available in a comprehensive range of compositions, purity levels, shapes and dimensions. For instance, the most common forms of targets including round, rectangular, ring and tube. They are in single or multiple sections construction depending on the size of the target and the properties of the material. We can customise to suit your needs.

Pure metals and alloys sputtering targets
Al: Aluminium Target
Mo: Molybdenum Target
Aluminium-Titanium Target: Al(60)Ti(40)at%
Magnesium-Yttrium Target: Mg(95)Y(5)wt%
B: Boron Target
Nb: Niobium Target
Aluminium-Titanium Target: Al(67)Ti(33)at%
Magnesium-Zinc-Calcium Target: Mg(96.5)Zn(3)Ca(0.5)wt%
Bi: Bismuth Target
Ni: Nickel Target
Aluminium-Silicon Target: Al(99)Si(1)wt%
Manganese-Aluminium Target: Mn(60)Al(40)at%
Co: Cobalt Target
Sb: Antimony Target
Aluminium-Chromium Target: Al(50)Cr(50)at%
Molybdenum-Niobium Target: Mo(90)Nb(10)wt%
Cr: Chromium Target
Sn: Tin Target
Aluminium-Chromium Target: Al(60)Cr(40)at%
Nickel-Indium Target: Ni(50)In(50)at%
Cu: Copper Target
Sr: Strontium Target
Aluminium-Copper Target: Al(99.5)Cu(0.5)wt%
Nickel-Chromium Target: Ni(80)Cr(20)wt%
Er: Erbium Target
Ta: Tantalum Target
Aluminium-Neodymium Target: Al(99)Nd(1)wt%
Nickel-Chromium Target: Ni(90)Cr(10)wt%
Fe: Iron Target
Ti: Titanium Target
Chromium-Aluminium Target: Cr(60)Al(40)at%
Nickel-Iron Target: Ni(82)Fe(18)wt%
Gd: Gadolinium Target
V: Vanadium Target
Cobalt-Iron Target: Co(50)Fe(50)wt%
Nickel-Vanadium Target: Ni(93)V(7)wt%
Hf: Hafnium Target
W: Tungsten Target
Cobalt-Iron-Boron Target: Co(60)Fe(20)B(20)at%
Titanium-Niobium Target: Ti(52)Nb(48)wt%
In: Indium Target
Y: Yttrium Target
Copper-Nickel Target: Cu(55)Ni(45)wt%
Titanium-Aluminium-Vanadium Target: Ti(90)Al(6)V(4)wt%
Mg: Magnesium Target
Zr: Zirconium Target
Copper-Nickel Target: Cu(90)Ni(10)wt%
Titanium-Silicon Target: Ti(85)Si(15)at%
Mn: Manganese Target
Copper-Zirconium Target: Cu(50)Zr(50)at%
Titanium-Silver Target: Ti(95)Ag(5)wt%
Copper-Nickel-Manganese Target: Cu(54)Ni(45)Mn(1)wt%
Tungsten-Copper Target: W(65)Cu(35)wt%
Iron-Manganese Target: Fe(50)Mn(50)wt%
Tungsten-Titanium Target: W(70)Ti(30)at%
Iron-Tin Target: Fe(50)Sn(50)at%
Tungsten-Titanium Target: W(90)Ti(10)wt%
Iron-Boron-Cobalt Target: Fe(70)B(20)Co(10)at%
Zirconium-Aluminium Target: Zr(70)Al(30)at%
Other compound sputtering targets
SiC: Silicon carbide Target
AL2O3: Aluminium oxide target
AlN: Aluminium nitride Target
TiB2: Titanium diboride Target
B4C: Boron carbide Target
TiN: Titanium nitride Target
Bi2FeCrO6 Target
WC: Tungsten carbide Target
BiFeO3 Target
WC-12Co Target
BiMnO3 Target
YMnO3 Target
In2O3: Indium oxide Target
ZnO(95)Al2O3(5)wt%
ITO Target: In2O3(90)SnO2(10)wt%
ZnO(99.5)Al2O3(0.5)wt%
MoS2: Molybdenum disulfide Target
ZnO: Zinc oxide Target
Production & QC
Why Choose Us

About us

1, We have special teams to manage the order,production,QC and delivery

Equipment & technology

2, The latest research and machines will assure the quality

Service

3, Experienced workers and salers will make goods and export more stable.

FAQ

1. Question: Can we get samples?
     Answer: Yes, we can offer you free samples for testing, you just need to pay the sample delivery cost.


2. Question: Can you do OEM products?(Paste our logo on the packing or produce according to our demand)
     Answer: Yes, customized products are available for us.


3. Question: How would you delivey the goods?
     Answer: Usually, we will delivery small package by UPS, EMS etc. And sea/air shipment for bulk quantity.


4. Question: What is payment way?
     Answer: Most of time, our customers pay us through T/T, Western Union, L/C. 


5. Question: It is risky for us to make the payment for our first cooperation, do you have better ways?
     Answer: Now, we do have secure way for you, it is Ali Trade Assurance. Please just contact for more details if you need.

Related Products

High purity Chromium sputtering target, Cr sputtering targets

Chromium alloy sputtering target including AlCr NiCr CrAlSi target

High quality pure metal sputtering target, ceramic material sputtering target

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