Plasma enhanced CVD machine for graphene production Application

PECVD system is designed to decrease reaction temperature of traditional CVD. It installed RF induction equipment in front of traditional CVD to ionize reacting gas, so plasma is generated. Plasma’s high activity is Reaction is accelerated due to the high activity of plasma. So, this system is called PECVD.
This model is the newest product, it synthesized the advantages of most tube PECVD system, and added pre-heating zone in the front of PECVD system. Tests showed that the deposition speed is quicker, film quality is better, holes is less, and won’t crack. AIO fully automatic intelligent control system is independently designed by our company, it is more convenient to operate and its function is more powerful.

Main Features

1) Preheating——front gas heating zone is added, deposition speed is quicker, film quality is better.

2) AIO control system——heating control, plasma RF control, gas-flow rate control, vacuum system control all synthesized in a 7 inch touch screen, easy to operate.

3) Auto pressure balance——tube inner pressure real-time monitoring, auto balancing.

4)Intelligent gas circuit on-off——each gas circuit can set switch on or off time, is time and labor saving.

5) FR power and switch timing control——Power and running time can preset, automatically run.

6)Chamber speed adjustable——According to experiment need, chamber speed and distance can be set.

7)Integration Design——The whole machine is integrated into one, easy to move.